Two people in cleanroom clothing standing in front of a device that looks like a large metal cabinet.

Products & Solutions

XUV/EUV Systems

Two people in cleanroom clothing stand in front of the control panel of a device that looks like a large metal cabinet.

Products & Solutions

XUV/EUV Systems

EUV/XUV Solutions

RI Research Instruments provides advanced solutions utilizing XUV and EUV photons for applications in nanoscopy, nanolytics, and EUV lithography infrastructure. We deliver stand-alone tools to leading semiconductor manufacturers and research institutions, supporting a broad spectrum of activities—from soft X-ray imaging of biological tissues to cutting-edge EUV applications. Our portfolio also includes systems for solar research, photochemistry, and customized DPP and LPP sources for XUV, EUV, and soft X-ray generation.

Our facilities are fully equipped with a comprehensive suite of tools, state-of-the-art machinery, dedicated cleanrooms, and advanced laboratories for cleanliness and precision measurement. All production processes are managed in-house, ensuring the highest standards of quality and performance.

Image of an EUV source. On the left is a control cabinet with buttons and a screen; on the right is the lamp in a football-sized metal chamber on a rolling table.

28 nm HP contact holes printed with interference exposer EUV-LET

EUV/XUV portfolio

Our building blocks, solutions and tools include:

Stand-alone DPP and LPP sources for XUV, EUV and soft X-rays with application tailored interfaces (debris mitigation, SPF, collectors) available in grades for R&D and for industrial use
Metrology tools for XUV source characterization
Actinic EUV tools for EUV-lithography supply chain such as:
- EUV-MBR: EUV Mask Blank Reflectometer for spectral reflectometry
- EUV-AIMER: full reticle inband EUV mapping reflectometry
- EUV-PRTT: EUV Pellicle reflection and transmission measurement tool
- EUV-TEUVL and EUV-LET: Actinic EUV resists flush or interference exposing for tests on sensitivity and resolution
Soft X-ray and EUV-microscopes
Solutions for spectrometry, nanotechnology, photochemistry
Solutions for EUV irradiation and interaction studies

EUV lithography

With the growing importance of chip mass production with EUV lithography (EUVL), there is an increasing need for actinic EUV solutions at the lithography wavelength of 13.5 nm, for metrology and tools for research, development, and in supply chain quality control.

RI Research Instruments contributes to establishing a sustainable EUV lithography infrastructure by developing actinic technology and tools, for instance stand-alone tools for EUV resist, pellicle, mask blank and mask characterization, which we deliver to world leading semiconductor companies and research labs. Our broad source portfolio of cutting-edge solutions is based on more than twenty years of experience with EUV and soft X-ray applications and our strong expertise in engineering, design, controls, manufacturing, cleanroom, and UHV.

Full area AIMER effective reflectance map of an absorber coated mask blank

Spectral resolved EUV Fram mask (center) compared to ref mirrors (left/right)

Image of EUV-PRTT, a large metal cabinet with control display and operating light

Customer specific developments

At RI, we provide more than just off-the-shelf solutions for actinic tools for EUV lithography, soft X-ray, and VUV applications. A core part of our business is to develop, design, manufacture, test and deliver systems and components tailored to the needs of our customers. With an established network of experienced partners, our developments are based on well-proven building blocks and components, backed by our experience in fast realization from drafted demands to dedicated tool operation at customers’ site.

Our research and application laboratories support such developments by enabling proof of concepts or tests of critical components with available EUV-sources, components and test installations.