The XUV Spectrophotometer (XUV-SPM) is designed to meet the demand of research and early developments of EUV components with in-house stand alone actinic EUV metrology laboratory installation which is flexible to covering wide ranges of sample sizes, angle of incidence and spectral band. It is based on using laboratory Extreme Ultraviolet (XUV) source technology for analytic applications. XUV-SPM is specialized for performing spectral resolved characterization toward optical elements, thin films and multilayer structures.

The XUV-SPM allows to measures in a wide spectral ranges, of 2 nm - 40 nm (50 eV- 500 eV). Using the XUV-SPM standalone solution, allows the transfer of many experiments which are routinely being performed at beamlines to the individual laboratories.