EUV Solutions
EUV Sources
EUV Solutions
EUV Sources
EUV-LAMP
RI’s EUV-LAMPs provide fast, safe, reliable, easy and cost-effective access to EUV radiation in research and application labs and allow for easy integration into metrology and exposure tools. OEM-Lamps are produced customer-specific. EUV-LAMP produce the EUV emitting plasma by a pulsed high-current discharge controlled by the electrical field between the electrodes.
Since 2001, over 40 EUV-LAMP systems have been manufactured, customized for various purposes: standalone experiments, OEM tasks, and as integral components in our own EUV-tools such as EUV-MBR, EUV-PRTT, and EUV-CMRT.
Our ownership of these flexible sources facilitates the design of new tool solutions. We offer tailored XUV-LAMPS with engineering support, proof-of-principle studies, and testing. Our solutions include debris mitigation, spectral filtering, in-vacuum thin film windows/filters, monitors, and beam-forming optics.
Besides this off-the-shelf solution, we offer custom tailored Laser Produced Plasma (LPP) systems and engineer source solutions that match your requirements.
Stand-alone EUV-Lamp with detached source head and control rack
Literature
R. Lebert, C. Phiesel, T. Missalla, and A. Biermanns-Föth: “The EUV-Lamp: A discharge-produced metrology EUV source”, Chapter 11 in Photon Sources for Lithography and Metrology, V. Bakshi, Editor, SPIE Press,. 413-476 (2023)
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